Ngspice BSIM (level 4) parameters

Name
Parameter
Units
l/w
VFB
Flat-band voltage
V
*
PHI
Surface inversion potential
V
*
K1
Body effect coefficient
$\sqrt{V}$
*
K2
Drain/source depletion charge-sharing coefficient
-
*
ETA
Zero-bias drain-induced barrier-lowering coefficient
-
*
MUZ
Zero-bias mobility
$\frac{cm^{2}}{V \cdot sec}$
DL
Shortening of channel
μm
DW
Narrowing of channel
μm
U0
Zero-bias transverse-field mobility degradation coefficient
$\frac{1}{V}$
*
U1
Zero-bias velocity saturation coefficient
$\frac{\mu}{V}$
*
X2MZ
Sens. of mobility to substrate bias at v=0
$\frac{cm^{2}}{V^{2} \cdot sec}$
*
X2E
Sens. of drain-induced barrier lowering effect to substrate bias
$\frac{1}{V}$
*
X3E
Sens. of drain-induced barrier lowering effect to drain bias at Vds = Vdd
$\frac{1}{V}$
*
X2U0
Sens. of transverse field mobility degradation effect to substrate bias
$\frac{1}{V^{2}}$
*
X2U1
Sens. of velocity saturation effect to substrate bias
$\frac{\mu m}{V^{2}}$
*
MUS
Mobility at zero substrate bias and at Vds = Vdd
$\frac{cm^{2}}{V^{2}sec}$
X2MS
Sens. of mobility to substrate bias at Vds = Vdd
$\frac{cm^{2}}{V^{2}sec}$
*
X3MS
Sens. of mobility to drain bias at Vds = Vdd
$\frac{cm^{2}}{V^{2}sec}$
*
X3U1
Sens. of velocity saturation effect on drain bias at Vds=Vdd
$\frac{\mu m}{V^{2}}$
*
TOX
Gate oxide thickness
μm
TEMP
Temperature where parameters were measured
C
VDD
Measurement bias range
V
CGDO
Gate-drain overlap capacitance per meter channel width
$\frac{F}{m}$
CGSO
Gate-source overlap capacitance per meter channel width
$\frac{F}{m}$
CGBO
Gate-bulk overlap capacitance per meter channel length
$\frac{F}{m}$
XPART
Gate-oxide capacitance-charge model flag
-
N0
Zero-bias subthreshold slope coefficient
-
*
NB
Sens. of subthreshold slope to substrate bias
-
*
ND
Sens. of subthreshold slope to drain bias
-
*
RSH
Drain and source diffusion sheet resistance
$\frac{\Omega}{\square}$
JS
Source drain junction current density
$\frac{A}{m^{2}}$
PB
Built in potential of source drain junction
V
MJ
Grading coefficient of source drain junction
-
PBSW
Built in potential of source, drain junction sidewall
V
MJSW
Grading coefficient of source drain junction sidewall
-
CJ
Source drain junction capacitance per unit area
$\frac{F}{m^{2}}$
CJSW
source drain junction sidewall capacitance per unit length
$\frac{F}{m}$
WDF
Source drain junction default width
m
DELL
Source drain junction length reduction
m

xpart = 0 selects a 40/60 drain/source charge partition in saturation, while xpart=1 selects a 0/100 drain/source charge partition. nd, ng, and ns are the drain, gate, and source nodes, respectively. mname is the model name, area is the area factor, and off indicates an (optional) initial condition on the device for dc analysis. If the area factor is omitted, a value of 1.0 is assumed. The (optional) initial condition specification, using ic=vds,vgs is intended for use with the uic option on the .tran control line, when a transient analysis is desired starting from other than the quiescent operating point. See the .ic control line for a better way to set initial conditions.